Title:
Generation and Identification of the Trifluorosilylarsinidene F3SiAs and Isomeric Perfluorinated Arsasilene FAsSiF2
Author(s):
Deng, Guohai; Hasenstab-Riedel, Sebastian
Year of publication:
2024
Available Date:
2024-06-26T09:36:22Z
Abstract:
The trifluorosilylarsinidene F3SiAs in the triplet ground state has been generated through the reaction of laser-ablated silicon atoms with AsF3 in cryogenic Ne- and Ar-matrices. The reactions proceed with the initial formation perfluorinated arsasilene FAsSiF2 in the singlet ground state by two As‒F bonds insertion reaction on annealing. The trifluorosilylarsinidene F3SiAs was formed via F-migration reactions of FAsSiF2 under irradiation at UV light (λ = 275 nm). The characterization of FAsSiF2 and F3SiAs by IR matrix-isolation spectroscopy is supported by computations at CCSD(T)-F12/aug-cc-pVTZ and B3LYP/aug-cc-pVTZ levels of theory.
Part of Identifier:
e-ISSN (online): 1521-3765
Keywords:
Silylarsinidene
Arsasilene
Matrix isolation Infrared spectroscopy
Quantum chemical calculations
DDC-Classification:
540 Chemie und zugeordnete Wissenschaften
Publication Type:
Wissenschaftlicher Artikel
URL of the Original Publication:
DOI of the Original Publication:
Journaltitle:
Chemistry – A European Journal
Department/institution:
Biologie, Chemie, Pharmazie
Institut für Chemie und Biochemie
Comments:
Die Publikation wurde aus Open Access Publikationsgeldern der Freien Universität Berlin gefördert.