dc.contributor.author
Maudet, Florian
dc.contributor.author
Dijck, Charlotte Van
dc.contributor.author
Raza, Muhammad Hamid
dc.contributor.author
Dubourdieu, Catherine
dc.date.accessioned
2023-10-13T11:37:10Z
dc.date.available
2023-10-13T11:37:10Z
dc.identifier.uri
https://refubium.fu-berlin.de/handle/fub188/41108
dc.identifier.uri
http://dx.doi.org/10.17169/refubium-40829
dc.description.abstract
Spectroscopic ellipsometry is a powerful method with high surface sensitivity that can be used to monitor the growth of even sub-monolayer films. However, analysis of ultrathin films is complicated by the correlation between the dielectric constant and thickness. This problem is usually resolved by fixing one or the other value, limiting the information that can be extracted. Here, we propose a method to determine unambiguously the refractive index, extinction coefficient, and thickness of a film when a transparent range is available in the energy range investigated. We decompose the analysis in three steps. First, the thickness of the film is determined from the transparent range of the film. Then, knowing the thickness of the layer, an initial estimation of the refractive index and extinction coefficient is made based on a first-order Taylor expansion of the ellipsometric ratio. Finally, using this estimation, a numerical iteration is done to ensure convergence of the fit toward the solution. A theoretical example of the method is given for two different thicknesses of TiO2 films. Finally, the method is applied to the experimental data measured during the atomic layer deposition of a thin film of Hf0.5Zr0.5O2 grown on Si. The thickness, refractive index, and extinction coefficient are retrieved with high precision (respectively, 0.01 and 0.002) in the energy range of 3.5–6.5 eV. A detailed analysis is presented on the accuracy of the retrieved values and their dependency on random and systematic errors for different energy ranges.
en
dc.format.extent
10 Seiten
dc.rights.uri
https://creativecommons.org/licenses/by/4.0/
dc.subject
Quantum confinement
en
dc.subject
Dielectric properties
en
dc.subject
Atomic layer deposition
en
dc.subject.ddc
500 Naturwissenschaften und Mathematik::530 Physik::530 Physik
dc.title
A fully automatized method for the unambiguous wavelength-by-wavelength determination of the thickness and optical property of a very thin film with a transparent range
dc.type
Wissenschaftlicher Artikel
dcterms.bibliographicCitation.articlenumber
045301
dcterms.bibliographicCitation.doi
10.1063/5.0150135
dcterms.bibliographicCitation.journaltitle
Journal of Applied Physics
dcterms.bibliographicCitation.number
4
dcterms.bibliographicCitation.volume
134
dcterms.bibliographicCitation.url
https://doi.org/10.1063/5.0150135
refubium.affiliation
Biologie, Chemie, Pharmazie
refubium.affiliation.other
Institut für Chemie und Biochemie
refubium.resourceType.isindependentpub
no
dcterms.accessRights.openaire
open access
dcterms.isPartOf.eissn
1089-7550
refubium.resourceType.provider
WoS-Alert